Clean-room technology
The group at the Paul Scherrer Institute deals with the production of complex surface topographies up to the two-digit nanometre range.
The "Polymer Nanotechnology" group at the Paul Scherrer Institute PSI deals with the production of complex surface topographies up to the two-digit nanometre range. Clean-room technology such as lithographic processes and imprinting processes are used for this.
Clean rooms with a surface area of over 300 m2 are available at the PSI for structure generation and are equipped with the latest technology for photolithography, electron-beam lithography and nanoimprint lithography, dry and wet etching, metallisation, analytics and metrology.
Using e-beam lithography (EBL), structures can be inscribed with a resolution of up to approximately 20 nm. A modern EBL system (Vistec EB5000) is available for this. A speciality is grey-scale electron-beam lithography, which was developed at the PSI – a process that enables the production of complex structures.
Nanoimprint lithography (NIL) enables the reliable replication of micro and nano-structures using thermal or UV-assisted imprinting. These processes are carried out on an HEX03.
X-ray interference lithography (XIL) even enables structures up to the scale of below 10 nm. For such high-resolution structures, a dedicated XIL beamline is available at the Swiss Light Source.
Contact at the PSI for Polymer Nanotechnology: Dr. Helmut Schift, +41 56 310 28 39